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| MAM2007 will be held march 4-7,2007 in the Leuven, Belgium area |
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| Thank you very much for attending MAM 2006 in Grenoble which gathered this year about 180 participants. |
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WELCOME AT THE MATERIALS FOR ADVANCED METALLIZATION CONFERENCE 2006 HOMEPAGE
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| This workshop is the 15th in a series devoted to materials research, materials properties and interactions. Starting as workshop on refractory metals and silicides in the 80ies, moving to materials for advanced metallization in 1995, this years workshop will include new and challenging topics in the field of BEOL-45nm solutions and 32nm explorative work. |
| The objective of the workshop is to provide a forum for open discussions between science and industrial application. It is dedicated to materials scientists, process and integration engineers. |
| Topics include both fundamental and applied research, as well as issues related to introduction into manufacturing. With the progressive scaling down of device dimensions and the simultaneous demands for more functionality, the challenges have become tremendous. New and extensive materials research is needed to further follow IC scaling as well as to develop new devices on the nanoscale. Therefore this workshop is organised in cooperation with several European R&D projects active in the field (NANOCMOS, Sinano...) and will address the preliminary results that have been achieved. |
| Invited talks will be given by scientific and technical leaders in each of the key areas to present the current state-of-the-art and to stimulate technical discussions. |
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| Submission of papers dealing with |
| = Materials and structures for advanced micro- and nanoelectronics |
| = Basics and fundamental studies |
| = Metallization (IC and other applications) |
| = Low k and ULK dielectrics |
| = Silicides |
| = Nanoscale interconnects |
| = Integrated passives |
| = Modeling and simulation |
| = Reliability, lifetime and analytical techniques |
| =Interconnect related packaging issues (are encouraged) |
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